CORVALLIS, Ore.--Inpria Corporation, a pioneer in high-resolution photoresists for Extreme Ultraviolet (EUV) lithography, announced plans to scale production of their metal oxide EUV photoresists in a new facility in Corvallis, Oregon. This expansion was funded by the $10M+ financing round the company closed earlier this year.
Inpria is executing on the first phase of a multi-part plan which will provide sufficient volumes to support customer needs during initial adoption and, later, a full process ramp. Build-out will be completed on a phased basis as customer adoption accelerates and requires higher volume manufacturing. Jim LaCasse, Inpria’s Chairman of the Board and former CEO of NexPlanar (acquired by Cabot) reflected, “Having led several photoresist businesses, I believe Inpria is approaching a familiar inflection point. As such, the company is concentrated on completing the key infrastructure and process groundwork to support customer requirements now, and into the future.”
“We are delighted to announce this new facility as we begin to scale-up our product manufacturing,” said Andrew Grenville, CEO of Inpria Corporation. “We have improved and optimized our photoresist performance and have also demonstrated manufacturing compatibility with standard fab equipment. Since customer feedback has been positive, scaling the commercial production is now an immediate focus for the company. Enabling our customers’ adoption of EUV lithography is our primary overall objective, and working with ecosystem partners we are making tremendous progress.”
Inpria Corporation designs photoresists to unlock the full potential of EUV lithography. Inpria’s metal oxide photoresists for EUV enable superior performance with simplified processing. (www.inpria.com)